Si₃N₄ films were deposited on Si wafers by dielectric chemical vapor deposition (DCVD). Sample provided by Rupa Das (rupadas@mit.edu).

Wavelength (microns)	n	k
0.250 0.263 0.275 0.288 0.300 0.313 0.325 0.338 0.350 0.363 0.375 0.388 0.400 0.413 0.425 0.438 0.450 0.463 0.475 0.488 0.500 0.513 0.525 0.538 0.550 0.563 0.575 0.588 0.600 0.613 0.625 0.638 0.650 0.663 0.675 0.688 0.700 0.713 0.725 0.738 0.750 0.763 0.775 0.788 0.800 0.813 0.825 0.838 0.850 0.863 0.875 0.888 0.900 0.913 0.925 0.938 0.950 0.963 0.975 0.988 1.000 1.013 1.025 1.038 1.050 1.063 1.075 1.088 1.100 1.113 1.125 1.138 1.150 1.163 1.175 1.188 1.200 1.213 1.225 1.238 1.250 1.263 1.275 1.288 1.300 1.313 1.325 1.338 1.350 1.363 1.375 1.388 1.400 1.413 1.425 1.438 1.450 1.463 1.475 1.488 1.500	2.308 2.263 2.227 2.196 2.171 2.150 2.131 2.116 2.102 2.091 2.081 2.072 2.064 2.057 2.050 2.045 2.040 2.035 2.031 2.027 2.024 2.021 2.018 2.016 2.013 2.011 2.009 2.007 2.005 2.004 2.002 2.001 1.999 1.998 1.997 1.996 1.995 1.994 1.993 1.992 1.991 1.990 1.990 1.989 1.988 1.988 1.987 1.987 1.986 1.985 1.985 1.985 1.984 1.984 1.983 1.983 1.982 1.982 1.982 1.981 1.981 1.981 1.981 1.980 1.980 1.980 1.979 1.979 1.979 1.979 1.979 1.978 1.978 1.978 1.978 1.978 1.977 1.977 1.977 1.977 1.977 1.977 1.976 1.976 1.976 1.976 1.976 1.976 1.976 1.975 1.975 1.975 1.975 1.975 1.975 1.975 1.975 1.975 1.975 1.974 1.974	0.0442 0.0321 0.0235 0.0172 0.0126 0.00923 0.00675 0.00491 0.00355 0.00254 0.00180 0.00125 0.000851 0.000563 0.000361 0.000222 0.000131 0.000077 0.000051 0.000034 0.000023 0.000013 0.000008 0.000003 0.000001 0.000001 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0